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New Technique May Open Up an Era of Atomic-scale Semiconductor Devices

Researchers at North Carolina State University have developed a new technique for creating high-quality semiconductor thin films at the atomic scale – meaning the films are only one atom thick. The technique can be used to create these thin films on a large scale, sufficient to coat wafers that are two inches wide, or larger.

“This could be used to scale current semiconductor technologies down to the atomic scale – lasers, light-emitting diodes (LEDs), computer chips, anything,” says Dr. Linyou Cao, an assistant professor of materials science and engineering at NC State and senior author of a paper on the work. “People have been talking about this concept for a long time, but it wasn’t possible. With this discovery, I think it’s possible.” (more…)

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