A multi-institutional team of engineers has developed a new approach to the fabrication of nanostructures for the semiconductor and magnetic storage industries. This approach combines top-down advanced ink-jet printing technology with a bottom-up approach that involves self-assembling block copolymers, a type of material that can spontaneously form ultrafine structures.
The team, consisting of nine researchers from the University of Illinois at Urbana-Champaign, the University of Chicago and Hanyang University in Korea, was able to increase the resolution of their intricate structure fabrication from approximately 200 nanometers to approximately 15 nanometers. A nanometer is a billionth of a meter, the width of a double-stranded DNA molecule. (more…)